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Electrical Characterization of Nickel Oxide and Nickel Iron Oxide Thin Films and Resistive Random Access Memory Devices Grown by Radio Frequency Sputtering
Language: en
Pages: 240

Electrical Characterization of Nickel Oxide and Nickel Iron Oxide Thin Films and Resistive Random Access Memory Devices Grown by Radio Frequency Sputtering

Authors: James Nicholas Talbert
Categories: Nanoelectronics
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Reactive Radio Frequency Sputtering of Iron Oxide Thin Films for Electrical Resistivity Characterization
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Reactive Radio Frequency Sputtering of Iron Oxide Thin Films for Electrical Resistivity Characterization

Authors: Cullen Lee Hackler
Categories: Frequency stability
Type: BOOK - Published: 1974 - Publisher:

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The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media
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The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media

Authors: Jong-Kai Lin
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Type: BOOK - Published: 1986 - Publisher:

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Study on the electroforming and resistive switching behaviour of nickel oxide thin films for non-volatile memory applications
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Study on the electroforming and resistive switching behaviour of nickel oxide thin films for non-volatile memory applications

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Electrical Characterization of Hafnium Oxide (HfO2) Thin Films Deposited by RF Sputtering
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Electrical Characterization of Hafnium Oxide (HfO2) Thin Films Deposited by RF Sputtering

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