Facilitated by the increasing importance and demand of semiconductors for the smartphoneand even the automobile industry, thermal atomic layer deposition (ALD)

This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry optimizations

In recent years, increasing demand for microchips have been fueled by the rise of nano scale technologies that are difficult to fabricate. Atomic layer etching

Atomic layer deposition (ALD) and plasma enhanced atomic layer deposition (PEALD) are the most widely utilized deposition techniques in the semiconductor indust

Plasma-enhanced atomic layer deposition (PEALD) has demonstrated its superiority at coatingultra-conformal high dielectric thin-films, which are essential to th