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Structure and Properties of Titanium- and Hafnium- Nitride Films Prepared by Reactive Magnetron Sputtering
Language: en
Pages: 176
Authors: Bengt Olof Johansson
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Type: BOOK - Published: 1984 - Publisher:

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Structure and Properties of Titanium Nitride and Zirconium Nitride Thin Films Prepared by Reactive Ion Plating
Language: fi
Pages: 83
Authors: J. M. Molarius
Categories: Thin films
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Structure and Properties of Titanium Nitride and Zirconium Nitride Thin Films Prepared by Reactive Ion Plating
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Growth, Structure and Properties of Ternary Transition Metal Nitride Thin Films Prepared by Reactive Magnetron Sputtering
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Strukture and Properties of Titanium Nitride and Zirconium Nitride Thin Films Prepared by Reactive ion Plating
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