Initial Stages of Aluminum and Titanium Chemical Vapor Deposition Growth on Silicon(001)

Initial Stages of Aluminum and Titanium Chemical Vapor Deposition Growth on Silicon(001)
Author :
Publisher :
Total Pages : 206
Release :
ISBN-10 : MINN:31951P00693687E
ISBN-13 :
Rating : 4/5 ( Downloads)

Book Synopsis Initial Stages of Aluminum and Titanium Chemical Vapor Deposition Growth on Silicon(001) by : Toshiyuki Mitsui

Download or read book Initial Stages of Aluminum and Titanium Chemical Vapor Deposition Growth on Silicon(001) written by Toshiyuki Mitsui and published by . This book was released on 1999 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt:


Initial Stages of Aluminum and Titanium Chemical Vapor Deposition Growth on Silicon(001) Related Books

Initial Stages of Aluminum and Titanium Chemical Vapor Deposition Growth on Silicon(001)
Language: en
Pages: 206
Authors: Toshiyuki Mitsui
Categories:
Type: BOOK - Published: 1999 - Publisher:

DOWNLOAD EBOOK

Chemical Abstracts
Language: en
Pages: 2676
Authors:
Categories: Chemistry
Type: BOOK - Published: 2002 - Publisher:

DOWNLOAD EBOOK

Thermal and Dynamic Processes in Deposition, Growth, and Etching of Materials
Language: en
Pages: 574
Authors: Shrikant Prabhakar Lohokare
Categories:
Type: BOOK - Published: 1996 - Publisher:

DOWNLOAD EBOOK

Chemical vapor deposition (CVD) is becoming an increasingly important manufacturing process for the fabrication of VLSI and ULSI devices. A major challenge in o
American Doctoral Dissertations
Language: en
Pages: 776
Authors:
Categories: Dissertation abstracts
Type: BOOK - Published: 2001 - Publisher:

DOWNLOAD EBOOK

Chemical Vapor Deposition of Aluminum for Electronic Materials
Language: en
Pages: 442
Authors: Michael G. Simmonds
Categories:
Type: BOOK - Published: 1993 - Publisher:

DOWNLOAD EBOOK