Kinetics and Mechanism of Dissolution and Gasification in High Temperature Gas/metal Systems: Interaction of Tantalum, Niobium, and Vanadium with Partially Dissociated Nitrogen And/or Oxygen
Author | : Heng H. Feng |
Publisher | : |
Total Pages | : |
Release | : 1975 |
ISBN-10 | : OCLC:702699597 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Book Synopsis Kinetics and Mechanism of Dissolution and Gasification in High Temperature Gas/metal Systems: Interaction of Tantalum, Niobium, and Vanadium with Partially Dissociated Nitrogen And/or Oxygen by : Heng H. Feng
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