MOS (Metal Oxide Semiconductor) Physics and Technology
| Author | : E. H. Nicollian |
| Publisher | : John Wiley & Sons |
| Total Pages | : 928 |
| Release | : 2002-11-21 |
| ISBN-10 | : 9780471430797 |
| ISBN-13 | : 047143079X |
| Rating | : 4/5 (79X Downloads) |
Download or read book MOS (Metal Oxide Semiconductor) Physics and Technology written by E. H. Nicollian and published by John Wiley & Sons. This book was released on 2002-11-21 with total page 928 pages. Available in PDF, EPUB and Kindle. Book excerpt: Explains the theoretical and experimental foundations of the measurement of the electrical properties of the MOS system and the technology for controlling its properties. Emphasizes the silica and the silica-silicon interface. Provides a critical assessment of the literature, corrects incomplete or incorrect theoretical formulations, and gives critical comparisons of measurement methods. Contains information needed to grow an oxide, make an MOS capacitor array, and fabricate an integrated circuit with optimal performance and stability.
